Pushed Ilford PanF 50 to 200 ASA, questions on development

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I unintentionally shot Pan F at 200 and would like to develop trying a different developer than Kodak Dektol. I am contemplating using a high energy developer. It is my understanding that this is good for film that is underexposed by one or two stops which would be great for this roll. I would rather not increase the development time because I tend to underexpose film anyway and wouldn't it be better for grain and contrast to use a high energy. What I am really asking is: Am I correct in my idea about high energy developer, what type is good (I know of Diafine & Acufine - is this accurate), and how do I know how long to develop, can I use my regular stop & fix? thanks for any help that I may receive, Tricia

-- Tricia Bassett (tmb1022@aol.com), August 26, 2001

Answers

Pan F at EI 100 in diafine is a great combination. With my sloppy exposure guessing technique, I've underexposed Pan F at 200 or more before, and had satisfactory (not great)results with diafine. I stop with water and fix as usual. Good luck - John

-- John Fleetwood (johnfleetwood@hotmail.com), August 27, 2001.

Pan F at EI 100 in diafine is a great combination. With my sloppy exposure guessing technique, I've underexposed Pan F at 200 or less before, and had satisfactory (not great)results with diafine. I stop with water and fix as usual. Good luck - John

-- John Fleetwood (johnfleetwood@hotmail.com), August 27, 2001.

I have shot Pan F at EI 200 and developed it in Xtol at the time recommended in the Film Developing Cookbook. The contrast was a bit low but there was an adequate tonal scale. Grain was good.

-- Bert Krages (krages@onemain.com), August 27, 2001.

Either diafine or acufine should give you the needed boast. Follow the directions on the box or can regarding temperatures and developing times. I stop with filtered water and fix in Ilford rapid fix. The manufacturer of both developers(same company) does not recommend an acid stop.

-- Gene Crumpler (hassieguy@att.net), August 27, 2001.

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